Ion Implantation Equipment
Ion implantation is low-temperature process by which ions of one element are accelerated into a solid target, thereby changing the physical, chemical, or electrical properties of the target. Ion implantation is used in semiconductor device fabrication and in metal finishing, as well as in materials science research. The ions can alter the elemental composition of the target (if the ions differ in composition from the target) if they stop and remain in the target. Ion implantation cause also chemical and physical changes when the ions impinge on the target at high energy.
In many cases, it is often used in processes for controlling the electrical characteristics of semiconductor materials. Normally, depending on the beam quantity and energy of the generated ion beam, it is classified as a medium current ion implanter, a large current ion implanter and a high energy ion implanter.
Our Magnetic fluid feedthrough can also apply to ion implantation equipment, please call us or fill out the contact form for more information.